Run-to-run process control for chemical mechanical polishing in semiconductor manufacturing

Run-to-run process control for chemical mechanical polishing in semiconductor manufacturing

IEEE International Symposium on Intelligent Control - Proceedings

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Bibliographic Details
Main Authors: Da, L., Kumar, V.G., Tay, A., Al Mamun, A., Ho, W.K., See, A., Chan, L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Chemical mechanical polishing
Exponentially weighted moving-average
Run-to-run (R2R) control
Semiconductor manufacturing
Online Access:http://scholarbank.nus.edu.sg/handle/10635/71699
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Institution: National University of Singapore
Description
Summary:IEEE International Symposium on Intelligent Control - Proceedings

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