Run-to-run process control for chemical mechanical polishing in semiconductor manufacturing

IEEE International Symposium on Intelligent Control - Proceedings

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Bibliographic Details
Main Authors:	Da, L., Kumar, V.G., Tay, A., Al Mamun, A., Ho, W.K., See, A., Chan, L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	Chemical mechanical polishing Exponentially weighted moving-average Run-to-run (R2R) control Semiconductor manufacturing
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/71699
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-71699
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spelling	sg-nus-scholar.10635-716992015-01-30T17:04:28Z Run-to-run process control for chemical mechanical polishing in semiconductor manufacturing Da, L. Kumar, V.G. Tay, A. Al Mamun, A. Ho, W.K. See, A. Chan, L. ELECTRICAL & COMPUTER ENGINEERING Chemical mechanical polishing Exponentially weighted moving-average Run-to-run (R2R) control Semiconductor manufacturing IEEE International Symposium on Intelligent Control - Proceedings 740-745 85PUA 2014-06-19T03:26:45Z 2014-06-19T03:26:45Z 2002 Conference Paper Da, L.,Kumar, V.G.,Tay, A.,Al Mamun, A.,Ho, W.K.,See, A.,Chan, L. (2002). Run-to-run process control for chemical mechanical polishing in semiconductor manufacturing. IEEE International Symposium on Intelligent Control - Proceedings : 740-745. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/71699 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
topic	Chemical mechanical polishing Exponentially weighted moving-average Run-to-run (R2R) control Semiconductor manufacturing
spellingShingle	Chemical mechanical polishing Exponentially weighted moving-average Run-to-run (R2R) control Semiconductor manufacturing Da, L. Kumar, V.G. Tay, A. Al Mamun, A. Ho, W.K. See, A. Chan, L. Run-to-run process control for chemical mechanical polishing in semiconductor manufacturing
description	IEEE International Symposium on Intelligent Control - Proceedings
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Da, L. Kumar, V.G. Tay, A. Al Mamun, A. Ho, W.K. See, A. Chan, L.
format	Conference or Workshop Item
author	Da, L. Kumar, V.G. Tay, A. Al Mamun, A. Ho, W.K. See, A. Chan, L.
author_sort	Da, L.
title	Run-to-run process control for chemical mechanical polishing in semiconductor manufacturing
title_short	Run-to-run process control for chemical mechanical polishing in semiconductor manufacturing
title_full	Run-to-run process control for chemical mechanical polishing in semiconductor manufacturing
title_fullStr	Run-to-run process control for chemical mechanical polishing in semiconductor manufacturing
title_full_unstemmed	Run-to-run process control for chemical mechanical polishing in semiconductor manufacturing
title_sort	run-to-run process control for chemical mechanical polishing in semiconductor manufacturing
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/71699
_version_	1681087431401537536

Run-to-run process control for chemical mechanical polishing in semiconductor manufacturing

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