Run-to-run process control for chemical mechanical polishing in semiconductor manufacturing

• Main Authors: Da, L., Kumar, V.G., Tay, A., Al Mamun, A., Ho, W.K., See, A., Chan, L.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Subjects: Chemical mechanical polishing; Exponentially weighted moving-average; Run-to-run (R2R) control; Semiconductor manufacturing
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/71699
• Institution: National University of Singapore

IEEE International Symposium on Intelligent Control - Proceedings