Channel-width effect on hot-carrier degradation in NMOSFETs with recessed-LOCOS isolation structures

Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA

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Main Authors:	Yue, J.M.P., Chim, W.K., Cho, B.J., Chan, D.S.H., Qin, W.H., Kim, Y.B., Jang, S.A., Yeo, I.S.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/72517
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-72517
record_format	dspace
spelling	sg-nus-scholar.10635-725172015-04-05T20:09:00Z Channel-width effect on hot-carrier degradation in NMOSFETs with recessed-LOCOS isolation structures Yue, J.M.P. Chim, W.K. Cho, B.J. Chan, D.S.H. Qin, W.H. Kim, Y.B. Jang, S.A. Yeo, I.S. ELECTRICAL ENGINEERING Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 94-98 00234 2014-06-19T05:08:56Z 2014-06-19T05:08:56Z 1999 Conference Paper Yue, J.M.P.,Chim, W.K.,Cho, B.J.,Chan, D.S.H.,Qin, W.H.,Kim, Y.B.,Jang, S.A.,Yeo, I.S. (1999). Channel-width effect on hot-carrier degradation in NMOSFETs with recessed-LOCOS isolation structures. Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA : 94-98. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/72517 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Yue, J.M.P. Chim, W.K. Cho, B.J. Chan, D.S.H. Qin, W.H. Kim, Y.B. Jang, S.A. Yeo, I.S.
format	Conference or Workshop Item
author	Yue, J.M.P. Chim, W.K. Cho, B.J. Chan, D.S.H. Qin, W.H. Kim, Y.B. Jang, S.A. Yeo, I.S.
spellingShingle	Yue, J.M.P. Chim, W.K. Cho, B.J. Chan, D.S.H. Qin, W.H. Kim, Y.B. Jang, S.A. Yeo, I.S. Channel-width effect on hot-carrier degradation in NMOSFETs with recessed-LOCOS isolation structures
author_sort	Yue, J.M.P.
title	Channel-width effect on hot-carrier degradation in NMOSFETs with recessed-LOCOS isolation structures
title_short	Channel-width effect on hot-carrier degradation in NMOSFETs with recessed-LOCOS isolation structures
title_full	Channel-width effect on hot-carrier degradation in NMOSFETs with recessed-LOCOS isolation structures
title_fullStr	Channel-width effect on hot-carrier degradation in NMOSFETs with recessed-LOCOS isolation structures
title_full_unstemmed	Channel-width effect on hot-carrier degradation in NMOSFETs with recessed-LOCOS isolation structures
title_sort	channel-width effect on hot-carrier degradation in nmosfets with recessed-locos isolation structures
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/72517
_version_	1681087580182937600

Channel-width effect on hot-carrier degradation in NMOSFETs with recessed-LOCOS isolation structures

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