Process variation during tunnel window formation and its impact on the reliability performance of FLOTOX EEPROM devices

IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE

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Bibliographic Details
Main Authors: Lai, K.-K., Lim, P.-S., Chim, W.-K., Pan, Y.
Other Authors: ELECTRICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/72871
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Institution: National University of Singapore