Process variation during tunnel window formation and its impact on the reliability performance of FLOTOX EEPROM devices
IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE
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2014
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sg-nus-scholar.10635-728712024-11-14T10:20:58Z Process variation during tunnel window formation and its impact on the reliability performance of FLOTOX EEPROM devices Lai, K.-K. Lim, P.-S. Chim, W.-K. Pan, Y. ELECTRICAL ENGINEERING IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE 196-199 2014-06-19T05:12:55Z 2014-06-19T05:12:55Z 2000 Conference Paper Lai, K.-K.,Lim, P.-S.,Chim, W.-K.,Pan, Y. (2000). Process variation during tunnel window formation and its impact on the reliability performance of FLOTOX EEPROM devices. IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE : 196-199. ScholarBank@NUS Repository. 0780364309 http://scholarbank.nus.edu.sg/handle/10635/72871 NOT_IN_WOS Scopus |
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National University of Singapore |
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NUS Library |
| continent |
Asia |
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Singapore Singapore |
| content_provider |
NUS Library |
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ScholarBank@NUS |
| description |
IEEE International Conference on Semiconductor Electronics, Proceedings, ICSE |
| author2 |
ELECTRICAL ENGINEERING |
| author_facet |
ELECTRICAL ENGINEERING Lai, K.-K. Lim, P.-S. Chim, W.-K. Pan, Y. |
| format |
Conference or Workshop Item |
| author |
Lai, K.-K. Lim, P.-S. Chim, W.-K. Pan, Y. |
| spellingShingle |
Lai, K.-K. Lim, P.-S. Chim, W.-K. Pan, Y. Process variation during tunnel window formation and its impact on the reliability performance of FLOTOX EEPROM devices |
| author_sort |
Lai, K.-K. |
| title |
Process variation during tunnel window formation and its impact on the reliability performance of FLOTOX EEPROM devices |
| title_short |
Process variation during tunnel window formation and its impact on the reliability performance of FLOTOX EEPROM devices |
| title_full |
Process variation during tunnel window formation and its impact on the reliability performance of FLOTOX EEPROM devices |
| title_fullStr |
Process variation during tunnel window formation and its impact on the reliability performance of FLOTOX EEPROM devices |
| title_full_unstemmed |
Process variation during tunnel window formation and its impact on the reliability performance of FLOTOX EEPROM devices |
| title_sort |
process variation during tunnel window formation and its impact on the reliability performance of flotox eeprom devices |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/72871 |
| _version_ |
1821209353144762368 |