A comparative study for mask defect tolerance on phase and transmission for dry and immersion 193-nm lithography
10.1117/12.711629
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2014
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sg-nus-scholar.10635-730102024-11-13T04:24:18Z A comparative study for mask defect tolerance on phase and transmission for dry and immersion 193-nm lithography Ling, M.L. Chua, G.S. Tay, C.J. Quan, C. Lin, Q. MECHANICAL ENGINEERING Haze related defect Immersion lithography Mask transmission change Phase angle change Simulation 10.1117/12.711629 Proceedings of SPIE - The International Society for Optical Engineering 6520 PART 3 - PSISD 2014-06-19T05:30:08Z 2014-06-19T05:30:08Z 2007 Conference Paper Ling, M.L., Chua, G.S., Tay, C.J., Quan, C., Lin, Q. (2007). A comparative study for mask defect tolerance on phase and transmission for dry and immersion 193-nm lithography. Proceedings of SPIE - The International Society for Optical Engineering 6520 (PART 3) : -. ScholarBank@NUS Repository. https://doi.org/10.1117/12.711629 0819466395 0277786X http://scholarbank.nus.edu.sg/handle/10635/73010 000248110300129 Scopus |
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National University of Singapore |
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NUS Library |
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Asia |
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Singapore Singapore |
| content_provider |
NUS Library |
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ScholarBank@NUS |
| topic |
Haze related defect Immersion lithography Mask transmission change Phase angle change Simulation |
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Haze related defect Immersion lithography Mask transmission change Phase angle change Simulation Ling, M.L. Chua, G.S. Tay, C.J. Quan, C. Lin, Q. A comparative study for mask defect tolerance on phase and transmission for dry and immersion 193-nm lithography |
| description |
10.1117/12.711629 |
| author2 |
MECHANICAL ENGINEERING |
| author_facet |
MECHANICAL ENGINEERING Ling, M.L. Chua, G.S. Tay, C.J. Quan, C. Lin, Q. |
| format |
Conference or Workshop Item |
| author |
Ling, M.L. Chua, G.S. Tay, C.J. Quan, C. Lin, Q. |
| author_sort |
Ling, M.L. |
| title |
A comparative study for mask defect tolerance on phase and transmission for dry and immersion 193-nm lithography |
| title_short |
A comparative study for mask defect tolerance on phase and transmission for dry and immersion 193-nm lithography |
| title_full |
A comparative study for mask defect tolerance on phase and transmission for dry and immersion 193-nm lithography |
| title_fullStr |
A comparative study for mask defect tolerance on phase and transmission for dry and immersion 193-nm lithography |
| title_full_unstemmed |
A comparative study for mask defect tolerance on phase and transmission for dry and immersion 193-nm lithography |
| title_sort |
comparative study for mask defect tolerance on phase and transmission for dry and immersion 193-nm lithography |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/73010 |
| _version_ |
1821223163192672256 |