A comparative study for mask defect tolerance on phase and transmission for dry and immersion 193-nm lithography
10.1117/12.711629
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| Main Authors: | , , , , |
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| Other Authors: | |
| Format: | Conference or Workshop Item |
| Published: |
2014
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| Subjects: | |
| Online Access: | http://scholarbank.nus.edu.sg/handle/10635/73010 |
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| Institution: | National University of Singapore |