Circular apertures for contact hole patterning in 193nm immersion lithography

• Main Authors: Tay, C.J., Quan, C., Ling, M.L., Lin, Q., Tan, S.K., Chua, G.S.
• 其他作者: MECHANICAL ENGINEERING
• 格式: Conference or Workshop Item
• 出版: 2014
• 主題: Circular aperture; Contact hole patterning; Diffraction; Immersion lithography; OPC target; Resolution enhancement techniques; Square aperture
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/73250

10.1117/12.851318