Investigation on abrasive free Copper chemical mechanical planarization for Cu/low k and Cu/ultra low k interconnects

Materials Research Society Symposium Proceedings

Saved in:
Bibliographic Details
Main Authors: Balakumar, S., Haque, T., Kumar, R., Kumar, A.S., Rahman, M.
Other Authors: MECHANICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/73561
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore