Investigation on abrasive free Copper chemical mechanical planarization for Cu/low k and Cu/ultra low k interconnects
Materials Research Society Symposium Proceedings
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Main Authors: | Balakumar, S., Haque, T., Kumar, R., Kumar, A.S., Rahman, M. |
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Other Authors: | MECHANICAL ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/73561 |
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Institution: | National University of Singapore |
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