Impact of field enhancement on TDDB lifetimes of Cu/Low-k test structures
Small area finger test structures were designed to isolate and study the physical failure analysis of Cu/low-k system. This paper aims to study the impact of field enhancement and area scaling through the comparison of dielectric breakdown lifetime of the finger test structures and conventional comb...
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| Main Authors: | , , |
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| Other Authors: | |
| Format: | Conference or Workshop Item |
| Language: | English |
| Published: |
2013
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| Online Access: | https://hdl.handle.net/10356/85259 http://hdl.handle.net/10220/12363 |
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| Institution: | Nanyang Technological University |
| Language: | English |