Process window optimization of CPL mask for beyond 45nm lithography

10.1117/12.712456

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Bibliographic Details
Main Authors:	Tan, S.Y., Lin, Q., Tay, C.J., Quan, C.
Other Authors:	MECHANICAL ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	CPL MEEF Phase Zebra
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/73778
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-73778
record_format	dspace
spelling	sg-nus-scholar.10635-737782023-10-26T20:11:12Z Process window optimization of CPL mask for beyond 45nm lithography Tan, S.Y. Lin, Q. Tay, C.J. Quan, C. MECHANICAL ENGINEERING CPL MEEF Phase Zebra 10.1117/12.712456 Proceedings of SPIE - The International Society for Optical Engineering 6520 PART 2 - PSISD 2014-06-19T05:39:15Z 2014-06-19T05:39:15Z 2007 Conference Paper Tan, S.Y., Lin, Q., Tay, C.J., Quan, C. (2007). Process window optimization of CPL mask for beyond 45nm lithography. Proceedings of SPIE - The International Society for Optical Engineering 6520 (PART 2) : -. ScholarBank@NUS Repository. https://doi.org/10.1117/12.712456 0819466395 0277786X http://scholarbank.nus.edu.sg/handle/10635/73778 000248110300076 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	CPL MEEF Phase Zebra
spellingShingle	CPL MEEF Phase Zebra Tan, S.Y. Lin, Q. Tay, C.J. Quan, C. Process window optimization of CPL mask for beyond 45nm lithography
description	10.1117/12.712456
author2	MECHANICAL ENGINEERING
author_facet	MECHANICAL ENGINEERING Tan, S.Y. Lin, Q. Tay, C.J. Quan, C.
format	Conference or Workshop Item
author	Tan, S.Y. Lin, Q. Tay, C.J. Quan, C.
author_sort	Tan, S.Y.
title	Process window optimization of CPL mask for beyond 45nm lithography
title_short	Process window optimization of CPL mask for beyond 45nm lithography
title_full	Process window optimization of CPL mask for beyond 45nm lithography
title_fullStr	Process window optimization of CPL mask for beyond 45nm lithography
title_full_unstemmed	Process window optimization of CPL mask for beyond 45nm lithography
title_sort	process window optimization of cpl mask for beyond 45nm lithography
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/73778
_version_	1781783335374159872

Process window optimization of CPL mask for beyond 45nm lithography

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