Process window optimization of CPL mask for beyond 45nm lithography

• Main Authors: Tan, S.Y., Lin, Q., Tay, C.J., Quan, C.
• Other Authors: MECHANICAL ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Subjects: CPL; MEEF; Phase; Zebra
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/73778
• Institution: National University of Singapore

10.1117/12.712456