Two masks process for high aspect ratio inertial sensors with ajustable range

Proceedings of the International Semiconductor Conference, CAS

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Bibliographic Details
Main Authors: Iliescu, C., Avram, M., Miao, J., Tay, F.E.H., Xu, G.
Other Authors: MECHANICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/73986
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Institution: National University of Singapore
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