A thorough study of quasi-breakdown phenomenon of thin gate oxide in dual-gate CMOSFET's

10.1109/16.853038

محفوظ في:
التفاصيل البيبلوغرافية
المؤلفون الرئيسيون: Guan, H., Li, M.-F., He, Y., Cho, B.J., Dong, Z.
مؤلفون آخرون: ELECTRICAL ENGINEERING
التنسيق: مقال
منشور في: 2014
الموضوعات:
الوصول للمادة أونلاين:http://scholarbank.nus.edu.sg/handle/10635/80283
الوسوم: إضافة وسم
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المؤسسة: National University of Singapore
id sg-nus-scholar.10635-80283
record_format dspace
spelling sg-nus-scholar.10635-802832024-11-14T01:24:54Z A thorough study of quasi-breakdown phenomenon of thin gate oxide in dual-gate CMOSFET's Guan, H. Li, M.-F. He, Y. Cho, B.J. Dong, Z. ELECTRICAL ENGINEERING Direct tunneling MOS devices Oxide breakdown 10.1109/16.853038 IEEE Transactions on Electron Devices 47 8 1608-1616 IETDA 2014-10-07T02:55:49Z 2014-10-07T02:55:49Z 2000-08 Article Guan, H.,Li, M.-F.,He, Y.,Cho, B.J.,Dong, Z. (2000-08). A thorough study of quasi-breakdown phenomenon of thin gate oxide in dual-gate CMOSFET's. IEEE Transactions on Electron Devices 47 (8) : 1608-1616. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/16.853038" target="_blank">https://doi.org/10.1109/16.853038</a> 00189383 http://scholarbank.nus.edu.sg/handle/10635/80283 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Direct tunneling
MOS devices
Oxide breakdown
spellingShingle Direct tunneling
MOS devices
Oxide breakdown
Guan, H.
Li, M.-F.
He, Y.
Cho, B.J.
Dong, Z.
A thorough study of quasi-breakdown phenomenon of thin gate oxide in dual-gate CMOSFET's
description 10.1109/16.853038
author2 ELECTRICAL ENGINEERING
author_facet ELECTRICAL ENGINEERING
Guan, H.
Li, M.-F.
He, Y.
Cho, B.J.
Dong, Z.
format Article
author Guan, H.
Li, M.-F.
He, Y.
Cho, B.J.
Dong, Z.
author_sort Guan, H.
title A thorough study of quasi-breakdown phenomenon of thin gate oxide in dual-gate CMOSFET's
title_short A thorough study of quasi-breakdown phenomenon of thin gate oxide in dual-gate CMOSFET's
title_full A thorough study of quasi-breakdown phenomenon of thin gate oxide in dual-gate CMOSFET's
title_fullStr A thorough study of quasi-breakdown phenomenon of thin gate oxide in dual-gate CMOSFET's
title_full_unstemmed A thorough study of quasi-breakdown phenomenon of thin gate oxide in dual-gate CMOSFET's
title_sort thorough study of quasi-breakdown phenomenon of thin gate oxide in dual-gate cmosfet's
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/80283
_version_ 1821200872905900032