Electrical characterization of radio frequency sputtered hydrogenated amorphous silicon carbide films
Journal of Applied Physics
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sg-nus-scholar.10635-803882024-11-09T00:15:45Z Electrical characterization of radio frequency sputtered hydrogenated amorphous silicon carbide films Choi, W.K. Han, L.J. Loo, F.L. ELECTRICAL ENGINEERING Journal of Applied Physics 81 1 276-280 JAPIA 2014-10-07T02:56:59Z 2014-10-07T02:56:59Z 1997-01-01 Article Choi, W.K.,Han, L.J.,Loo, F.L. (1997-01-01). Electrical characterization of radio frequency sputtered hydrogenated amorphous silicon carbide films. Journal of Applied Physics 81 (1) : 276-280. ScholarBank@NUS Repository. 00218979 http://scholarbank.nus.edu.sg/handle/10635/80388 NOT_IN_WOS Scopus |
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ELECTRICAL ENGINEERING |
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ELECTRICAL ENGINEERING Choi, W.K. Han, L.J. Loo, F.L. |
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Choi, W.K. Han, L.J. Loo, F.L. |
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Choi, W.K. Han, L.J. Loo, F.L. Electrical characterization of radio frequency sputtered hydrogenated amorphous silicon carbide films |
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Choi, W.K. |
title |
Electrical characterization of radio frequency sputtered hydrogenated amorphous silicon carbide films |
title_short |
Electrical characterization of radio frequency sputtered hydrogenated amorphous silicon carbide films |
title_full |
Electrical characterization of radio frequency sputtered hydrogenated amorphous silicon carbide films |
title_fullStr |
Electrical characterization of radio frequency sputtered hydrogenated amorphous silicon carbide films |
title_full_unstemmed |
Electrical characterization of radio frequency sputtered hydrogenated amorphous silicon carbide films |
title_sort |
electrical characterization of radio frequency sputtered hydrogenated amorphous silicon carbide films |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/80388 |
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