Hot-carrier induced degradation of polysilicon and tungsten polycide gate MOSFETs under maximum substrate and gate current stresses

10.1088/0268-1242/11/10/005

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書目詳細資料
Main Authors: Lou, C.L., Chim, W.K., Chan, D.S.H., Pan, Y.
其他作者: ELECTRICAL ENGINEERING
格式: Article
出版: 2014
在線閱讀:http://scholarbank.nus.edu.sg/handle/10635/80545
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機構: National University of Singapore
實物特徵
總結:10.1088/0268-1242/11/10/005