Line-width dependence of void formation in TI-salicided BF 2-doped polysilicon lines

Materials Research Society Symposium - Proceedings

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Main Authors:	Chua, H.N., Pey, K.L., Siah, S.Y., Lim, E.H., Ho, C.S.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/80680
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-80680
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spelling	sg-nus-scholar.10635-806802015-02-24T20:57:25Z Line-width dependence of void formation in TI-salicided BF 2-doped polysilicon lines Chua, H.N. Pey, K.L. Siah, S.Y. Lim, E.H. Ho, C.S. ELECTRICAL ENGINEERING Materials Research Society Symposium - Proceedings 564 91-99 MRSPD 2014-10-07T03:00:09Z 2014-10-07T03:00:09Z 1999 Article Chua, H.N.,Pey, K.L.,Siah, S.Y.,Lim, E.H.,Ho, C.S. (1999). Line-width dependence of void formation in TI-salicided BF 2-doped polysilicon lines. Materials Research Society Symposium - Proceedings 564 : 91-99. ScholarBank@NUS Repository. 02729172 http://scholarbank.nus.edu.sg/handle/10635/80680 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	Materials Research Society Symposium - Proceedings
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Chua, H.N. Pey, K.L. Siah, S.Y. Lim, E.H. Ho, C.S.
format	Article
author	Chua, H.N. Pey, K.L. Siah, S.Y. Lim, E.H. Ho, C.S.
spellingShingle	Chua, H.N. Pey, K.L. Siah, S.Y. Lim, E.H. Ho, C.S. Line-width dependence of void formation in TI-salicided BF 2-doped polysilicon lines
author_sort	Chua, H.N.
title	Line-width dependence of void formation in TI-salicided BF 2-doped polysilicon lines
title_short	Line-width dependence of void formation in TI-salicided BF 2-doped polysilicon lines
title_full	Line-width dependence of void formation in TI-salicided BF 2-doped polysilicon lines
title_fullStr	Line-width dependence of void formation in TI-salicided BF 2-doped polysilicon lines
title_full_unstemmed	Line-width dependence of void formation in TI-salicided BF 2-doped polysilicon lines
title_sort	line-width dependence of void formation in ti-salicided bf 2-doped polysilicon lines
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/80680
_version_	1681088932718051328

Line-width dependence of void formation in TI-salicided BF 2-doped polysilicon lines

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