Line-width dependence of void formation in TI-salicided BF 2-doped polysilicon lines
Materials Research Society Symposium - Proceedings
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Main Authors: | Chua, H.N., Pey, K.L., Siah, S.Y., Lim, E.H., Ho, C.S. |
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Other Authors: | ELECTRICAL ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/80680 |
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Institution: | National University of Singapore |
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