Low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressing
10.1109/55.720187
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sg-nus-scholar.10635-806902024-11-14T10:20:41Z Low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressing Chim, W.K. Yeo, B.P. Lim, P.S. Chan, D.S.H. ELECTRICAL ENGINEERING 10.1109/55.720187 IEEE Electron Device Letters 19 10 363-366 EDLED 2014-10-07T03:00:15Z 2014-10-07T03:00:15Z 1998-10 Article Chim, W.K., Yeo, B.P., Lim, P.S., Chan, D.S.H. (1998-10). Low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressing. IEEE Electron Device Letters 19 (10) : 363-366. ScholarBank@NUS Repository. https://doi.org/10.1109/55.720187 07413106 http://scholarbank.nus.edu.sg/handle/10635/80690 000076221200001 Scopus |
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ELECTRICAL ENGINEERING |
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ELECTRICAL ENGINEERING Chim, W.K. Yeo, B.P. Lim, P.S. Chan, D.S.H. |
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Article |
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Chim, W.K. Yeo, B.P. Lim, P.S. Chan, D.S.H. |
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Chim, W.K. Yeo, B.P. Lim, P.S. Chan, D.S.H. Low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressing |
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Chim, W.K. |
title |
Low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressing |
title_short |
Low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressing |
title_full |
Low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressing |
title_fullStr |
Low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressing |
title_full_unstemmed |
Low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressing |
title_sort |
low-frequency noise characterizattion of latent damage in thin oxides subjected to high-field impulse stressing |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/80690 |
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