Photoresist patterning and ion implantation degradation effects on flash memory device yield
10.1149/1.1391143
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sg-nus-scholar.10635-809802015-01-16T16:52:11Z Photoresist patterning and ion implantation degradation effects on flash memory device yield Cha, C.L. Ngo, Q. Chor, E.F. See, A.K. Lee, T.J. ELECTRICAL ENGINEERING 10.1149/1.1391143 Electrochemical and Solid-State Letters 3 7 340-342 ESLEF 2014-10-07T03:03:21Z 2014-10-07T03:03:21Z 2000-07 Article Cha, C.L.,Ngo, Q.,Chor, E.F.,See, A.K.,Lee, T.J. (2000-07). Photoresist patterning and ion implantation degradation effects on flash memory device yield. Electrochemical and Solid-State Letters 3 (7) : 340-342. ScholarBank@NUS Repository. <a href="https://doi.org/10.1149/1.1391143" target="_blank">https://doi.org/10.1149/1.1391143</a> 10990062 http://scholarbank.nus.edu.sg/handle/10635/80980 NOT_IN_WOS Scopus |
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ELECTRICAL ENGINEERING |
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ELECTRICAL ENGINEERING Cha, C.L. Ngo, Q. Chor, E.F. See, A.K. Lee, T.J. |
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Cha, C.L. Ngo, Q. Chor, E.F. See, A.K. Lee, T.J. |
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Cha, C.L. Ngo, Q. Chor, E.F. See, A.K. Lee, T.J. Photoresist patterning and ion implantation degradation effects on flash memory device yield |
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Cha, C.L. |
title |
Photoresist patterning and ion implantation degradation effects on flash memory device yield |
title_short |
Photoresist patterning and ion implantation degradation effects on flash memory device yield |
title_full |
Photoresist patterning and ion implantation degradation effects on flash memory device yield |
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Photoresist patterning and ion implantation degradation effects on flash memory device yield |
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Photoresist patterning and ion implantation degradation effects on flash memory device yield |
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photoresist patterning and ion implantation degradation effects on flash memory device yield |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/80980 |
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