Photoresist patterning and ion implantation degradation effects on flash memory device yield
10.1149/1.1391143
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Main Authors: | Cha, C.L., Ngo, Q., Chor, E.F., See, A.K., Lee, T.J. |
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Other Authors: | ELECTRICAL ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/80980 |
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Institution: | National University of Singapore |
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