Post-stress dual-trap interaction in hot-carrier stressed submicrometer n-channel metal-oxide-semiconductor field-effect-transistors

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

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Bibliographic Details
Main Authors:	Chim, W.K., Chua, T.J.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Article
Published:	2014
Subjects:	Capture cross section Hot carrier Interface states Interface traps N-channel MOSFETs Post-stress effect
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/81001
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-81001
record_format	dspace
spelling	sg-nus-scholar.10635-810012015-01-08T09:37:01Z Post-stress dual-trap interaction in hot-carrier stressed submicrometer n-channel metal-oxide-semiconductor field-effect-transistors Chim, W.K. Chua, T.J. ELECTRICAL ENGINEERING Capture cross section Hot carrier Interface states Interface traps N-channel MOSFETs Post-stress effect Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 36 10 6170-6174 JAPND 2014-10-07T03:03:35Z 2014-10-07T03:03:35Z 1997 Article Chim, W.K.,Chua, T.J. (1997). Post-stress dual-trap interaction in hot-carrier stressed submicrometer n-channel metal-oxide-semiconductor field-effect-transistors. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 36 (10) : 6170-6174. ScholarBank@NUS Repository. 00214922 http://scholarbank.nus.edu.sg/handle/10635/81001 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
topic	Capture cross section Hot carrier Interface states Interface traps N-channel MOSFETs Post-stress effect
spellingShingle	Capture cross section Hot carrier Interface states Interface traps N-channel MOSFETs Post-stress effect Chim, W.K. Chua, T.J. Post-stress dual-trap interaction in hot-carrier stressed submicrometer n-channel metal-oxide-semiconductor field-effect-transistors
description	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Chim, W.K. Chua, T.J.
format	Article
author	Chim, W.K. Chua, T.J.
author_sort	Chim, W.K.
title	Post-stress dual-trap interaction in hot-carrier stressed submicrometer n-channel metal-oxide-semiconductor field-effect-transistors
title_short	Post-stress dual-trap interaction in hot-carrier stressed submicrometer n-channel metal-oxide-semiconductor field-effect-transistors
title_full	Post-stress dual-trap interaction in hot-carrier stressed submicrometer n-channel metal-oxide-semiconductor field-effect-transistors
title_fullStr	Post-stress dual-trap interaction in hot-carrier stressed submicrometer n-channel metal-oxide-semiconductor field-effect-transistors
title_full_unstemmed	Post-stress dual-trap interaction in hot-carrier stressed submicrometer n-channel metal-oxide-semiconductor field-effect-transistors
title_sort	post-stress dual-trap interaction in hot-carrier stressed submicrometer n-channel metal-oxide-semiconductor field-effect-transistors
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/81001
_version_	1681088991581962240

Post-stress dual-trap interaction in hot-carrier stressed submicrometer n-channel metal-oxide-semiconductor field-effect-transistors

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