Post-stress dual-trap interaction in hot-carrier stressed submicrometer n-channel metal-oxide-semiconductor field-effect-transistors

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

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Bibliographic Details
Main Authors: Chim, W.K., Chua, T.J.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/81001
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Institution: National University of Singapore

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