Removing spherical silica particles from Si, Ge and NiP substrates by KrF excimer laser

Removing spherical silica particles from Si, Ge and NiP substrates by KrF excimer laser

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

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書目詳細資料
Main Authors:	Zheng, Y.-W., Lu, Y.-F., Mai, Z.-H., Song, W.-D.
其他作者:	ELECTRICAL ENGINEERING
格式:	Article
出版:	2014
在線閱讀:	http://scholarbank.nus.edu.sg/handle/10635/81097
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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