Impact of voids in Ti-salicided p+ polysilicon lines on TiSi2 electrical properties

Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA

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Bibliographic Details
Main Authors:	Chua, H.N., Pey, K.L., Siah, S.Y., Ong, L.Y., Lim, E.H., Gan, C.L., See, K.H., Ho, C.S.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/81467
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-81467
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spelling	sg-nus-scholar.10635-814672015-01-16T22:03:04Z Impact of voids in Ti-salicided p+ polysilicon lines on TiSi2 electrical properties Chua, H.N. Pey, K.L. Siah, S.Y. Ong, L.Y. Lim, E.H. Gan, C.L. See, K.H. Ho, C.S. ELECTRICAL ENGINEERING PHYSICS Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 44-49 234 2014-10-07T03:08:38Z 2014-10-07T03:08:38Z 1999 Conference Paper Chua, H.N.,Pey, K.L.,Siah, S.Y.,Ong, L.Y.,Lim, E.H.,Gan, C.L.,See, K.H.,Ho, C.S. (1999). Impact of voids in Ti-salicided p+ polysilicon lines on TiSi2 electrical properties. Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA : 44-49. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/81467 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Chua, H.N. Pey, K.L. Siah, S.Y. Ong, L.Y. Lim, E.H. Gan, C.L. See, K.H. Ho, C.S.
format	Conference or Workshop Item
author	Chua, H.N. Pey, K.L. Siah, S.Y. Ong, L.Y. Lim, E.H. Gan, C.L. See, K.H. Ho, C.S.
spellingShingle	Chua, H.N. Pey, K.L. Siah, S.Y. Ong, L.Y. Lim, E.H. Gan, C.L. See, K.H. Ho, C.S. Impact of voids in Ti-salicided p+ polysilicon lines on TiSi2 electrical properties
author_sort	Chua, H.N.
title	Impact of voids in Ti-salicided p+ polysilicon lines on TiSi2 electrical properties
title_short	Impact of voids in Ti-salicided p+ polysilicon lines on TiSi2 electrical properties
title_full	Impact of voids in Ti-salicided p+ polysilicon lines on TiSi2 electrical properties
title_fullStr	Impact of voids in Ti-salicided p+ polysilicon lines on TiSi2 electrical properties
title_full_unstemmed	Impact of voids in Ti-salicided p+ polysilicon lines on TiSi2 electrical properties
title_sort	impact of voids in ti-salicided p+ polysilicon lines on tisi2 electrical properties
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/81467
_version_	1681089076634058752

Impact of voids in Ti-salicided p+ polysilicon lines on TiSi2 electrical properties

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