Real-time control of photoresist thickness uniformity during the bake process

10.1117/12.410103

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Bibliographic Details
Main Authors:	Lay, Lee Lay, Schaper, Charles, Khuen, Ho Weng
Other Authors:	ELECTRICAL ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/81701
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-81701
record_format	dspace
spelling	sg-nus-scholar.10635-817012015-01-26T13:50:16Z Real-time control of photoresist thickness uniformity during the bake process Lay, Lee Lay Schaper, Charles Khuen, Ho Weng ELECTRICAL ENGINEERING 10.1117/12.410103 Proceedings of SPIE - The International Society for Optical Engineering 4182 54-64 PSISD 2014-10-07T03:11:05Z 2014-10-07T03:11:05Z 2000 Conference Paper Lay, Lee Lay,Schaper, Charles,Khuen, Ho Weng (2000). Real-time control of photoresist thickness uniformity during the bake process. Proceedings of SPIE - The International Society for Optical Engineering 4182 : 54-64. ScholarBank@NUS Repository. <a href="https://doi.org/10.1117/12.410103" target="_blank">https://doi.org/10.1117/12.410103</a> 0277786X http://scholarbank.nus.edu.sg/handle/10635/81701 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	10.1117/12.410103
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Lay, Lee Lay Schaper, Charles Khuen, Ho Weng
format	Conference or Workshop Item
author	Lay, Lee Lay Schaper, Charles Khuen, Ho Weng
spellingShingle	Lay, Lee Lay Schaper, Charles Khuen, Ho Weng Real-time control of photoresist thickness uniformity during the bake process
author_sort	Lay, Lee Lay
title	Real-time control of photoresist thickness uniformity during the bake process
title_short	Real-time control of photoresist thickness uniformity during the bake process
title_full	Real-time control of photoresist thickness uniformity during the bake process
title_fullStr	Real-time control of photoresist thickness uniformity during the bake process
title_full_unstemmed	Real-time control of photoresist thickness uniformity during the bake process
title_sort	real-time control of photoresist thickness uniformity during the bake process
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/81701
_version_	1681089119196807168

Real-time control of photoresist thickness uniformity during the bake process

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