Real-time control of photoresist thickness uniformity during the bake process

Real-time control of photoresist thickness uniformity during the bake process

10.1117/12.410103

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Bibliographic Details
Main Authors: Lay, Lee Lay, Schaper, Charles, Khuen, Ho Weng
Other Authors: ELECTRICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/81701
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Institution: National University of Singapore
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