Alternative surface passivation on germanium for metal-oxide-semiconductor applications with high-k gate dielectric

Alternative surface passivation on germanium for metal-oxide-semiconductor applications with high-k gate dielectric

10.1063/1.1812835

Saved in:
Bibliographic Details
Main Authors: Wu, N., Zhang, Q., Zhu, C., Chan, D.S.H., Li, M.F., Balasubramanian, N., Chin, A., Kwong, D.-L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/81945
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
Description
Summary:10.1063/1.1812835

Similar Items