Alternative surface passivation on germanium for metal-oxide-semiconductor applications with high-k gate dielectric

10.1063/1.1812835

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Bibliographic Details
Main Authors: Wu, N., Zhang, Q., Zhu, C., Chan, D.S.H., Li, M.F., Balasubramanian, N., Chin, A., Kwong, D.-L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/81945
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Institution: National University of Singapore

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