Alternative surface passivation on germanium for metal-oxide-semiconductor applications with high-k gate dielectric

Alternative surface passivation on germanium for metal-oxide-semiconductor applications with high-k gate dielectric

10.1063/1.1812835

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書目詳細資料
Main Authors:	Wu, N., Zhang, Q., Zhu, C., Chan, D.S.H., Li, M.F., Balasubramanian, N., Chin, A., Kwong, D.-L.
其他作者:	ELECTRICAL & COMPUTER ENGINEERING
格式:	Article
出版:	2014
在線閱讀:	http://scholarbank.nus.edu.sg/handle/10635/81945
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!
機構:	National University of Singapore

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