BTI and charge trapping in germanium p- And n-MOSFETs with CVD HfO 2 gate dielectric

BTI and charge trapping in germanium p- And n-MOSFETs with CVD HfO 2 gate dielectric

Technical Digest - International Electron Devices Meeting, IEDM

Saved in:
Bibliographic Details
Main Authors: Wu, N., Zhang, Q., Zhu, C., Shen, C., Li, M.F., Chan, D.S.H., Balasubramanian, N.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83524
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/83524

Similar Items