Channel mobility degradation and charge trapping in high-k/metal gate NMOSFETs

10.1016/j.tsf.2004.05.017

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Bibliographic Details
Main Authors:	Mathew, S., Bera, L.K., Balasubramanian, N., Joo, M.S., Cho, B.J.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Charge trapping HfAlO High-k dielectrics Mobility
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82034
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-82034
record_format	dspace
spelling	sg-nus-scholar.10635-820342024-11-14T01:24:20Z Channel mobility degradation and charge trapping in high-k/metal gate NMOSFETs Mathew, S. Bera, L.K. Balasubramanian, N. Joo, M.S. Cho, B.J. ELECTRICAL & COMPUTER ENGINEERING Charge trapping HfAlO High-k dielectrics Mobility 10.1016/j.tsf.2004.05.017 Thin Solid Films 462-463 SPEC. ISS. 11-14 THSFA 2014-10-07T04:24:37Z 2014-10-07T04:24:37Z 2004-09 Article Mathew, S., Bera, L.K., Balasubramanian, N., Joo, M.S., Cho, B.J. (2004-09). Channel mobility degradation and charge trapping in high-k/metal gate NMOSFETs. Thin Solid Films 462-463 (SPEC. ISS.) : 11-14. ScholarBank@NUS Repository. https://doi.org/10.1016/j.tsf.2004.05.017 00406090 http://scholarbank.nus.edu.sg/handle/10635/82034 000223812800004 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Charge trapping HfAlO High-k dielectrics Mobility
spellingShingle	Charge trapping HfAlO High-k dielectrics Mobility Mathew, S. Bera, L.K. Balasubramanian, N. Joo, M.S. Cho, B.J. Channel mobility degradation and charge trapping in high-k/metal gate NMOSFETs
description	10.1016/j.tsf.2004.05.017
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Mathew, S. Bera, L.K. Balasubramanian, N. Joo, M.S. Cho, B.J.
format	Article
author	Mathew, S. Bera, L.K. Balasubramanian, N. Joo, M.S. Cho, B.J.
author_sort	Mathew, S.
title	Channel mobility degradation and charge trapping in high-k/metal gate NMOSFETs
title_short	Channel mobility degradation and charge trapping in high-k/metal gate NMOSFETs
title_full	Channel mobility degradation and charge trapping in high-k/metal gate NMOSFETs
title_fullStr	Channel mobility degradation and charge trapping in high-k/metal gate NMOSFETs
title_full_unstemmed	Channel mobility degradation and charge trapping in high-k/metal gate NMOSFETs
title_sort	channel mobility degradation and charge trapping in high-k/metal gate nmosfets
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82034
_version_	1821180730665861120

Channel mobility degradation and charge trapping in high-k/metal gate NMOSFETs

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