Comparison of electrical stress-induced charge carrier generation/trapping and related degradation of SiO2 and HfO2/SiO2 gate dielectric stacks
10.1016/j.microrel.2010.07.005
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sg-nus-scholar.10635-820752023-10-29T23:36:20Z Comparison of electrical stress-induced charge carrier generation/trapping and related degradation of SiO2 and HfO2/SiO2 gate dielectric stacks Samanta, P. Zhu, C. Chan, M. ELECTRICAL & COMPUTER ENGINEERING 10.1016/j.microrel.2010.07.005 Microelectronics Reliability 50 12 1907-1914 MCRLA 2014-10-07T04:25:05Z 2014-10-07T04:25:05Z 2010-12 Article Samanta, P., Zhu, C., Chan, M. (2010-12). Comparison of electrical stress-induced charge carrier generation/trapping and related degradation of SiO2 and HfO2/SiO2 gate dielectric stacks. Microelectronics Reliability 50 (12) : 1907-1914. ScholarBank@NUS Repository. https://doi.org/10.1016/j.microrel.2010.07.005 00262714 http://scholarbank.nus.edu.sg/handle/10635/82075 000285667300001 Scopus |
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Asia |
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Singapore Singapore |
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| description |
10.1016/j.microrel.2010.07.005 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Samanta, P. Zhu, C. Chan, M. |
| format |
Article |
| author |
Samanta, P. Zhu, C. Chan, M. |
| spellingShingle |
Samanta, P. Zhu, C. Chan, M. Comparison of electrical stress-induced charge carrier generation/trapping and related degradation of SiO2 and HfO2/SiO2 gate dielectric stacks |
| author_sort |
Samanta, P. |
| title |
Comparison of electrical stress-induced charge carrier generation/trapping and related degradation of SiO2 and HfO2/SiO2 gate dielectric stacks |
| title_short |
Comparison of electrical stress-induced charge carrier generation/trapping and related degradation of SiO2 and HfO2/SiO2 gate dielectric stacks |
| title_full |
Comparison of electrical stress-induced charge carrier generation/trapping and related degradation of SiO2 and HfO2/SiO2 gate dielectric stacks |
| title_fullStr |
Comparison of electrical stress-induced charge carrier generation/trapping and related degradation of SiO2 and HfO2/SiO2 gate dielectric stacks |
| title_full_unstemmed |
Comparison of electrical stress-induced charge carrier generation/trapping and related degradation of SiO2 and HfO2/SiO2 gate dielectric stacks |
| title_sort |
comparison of electrical stress-induced charge carrier generation/trapping and related degradation of sio2 and hfo2/sio2 gate dielectric stacks |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/82075 |
| _version_ |
1781784054763356160 |