Energy gap and band alignment for (HfO2)x(Al 2O3)1-x on (100) Si

10.1063/1.1492024

Saved in:
Bibliographic Details
Main Authors: Yu, H.Y., Li, M.F., Cho, B.J., Yeo, C.C., Joo, M.S., Kwong, D.-L., Pan, J.S., Ang, C.H., Zheng, J.Z., Ramanathan, S.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82277
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore