Excellent surface passivation of heavily doped p+ silicon by low-temperature plasma-deposited SiOx/SiNy dielectric stacks with optimised antireflective performance for solar cell application

10.1016/j.solmat.2013.09.004

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Bibliographic Details
Main Authors:	Duttagupta, S., Ma, F.-J., Hoex, B., Aberle, A.G.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Boron doped p+ emitters Crystalline silicon Plasma-enhanced chemical vapor deposition Silicon oxide/Silicon nitride dielectric stacks Surface passivation
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82313
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-82313
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spelling	sg-nus-scholar.10635-823132024-11-12T21:34:55Z Excellent surface passivation of heavily doped p+ silicon by low-temperature plasma-deposited SiOx/SiNy dielectric stacks with optimised antireflective performance for solar cell application Duttagupta, S. Ma, F.-J. Hoex, B. Aberle, A.G. ELECTRICAL & COMPUTER ENGINEERING SOLAR ENERGY RESEARCH INST OF S'PORE Boron doped p+ emitters Crystalline silicon Plasma-enhanced chemical vapor deposition Silicon oxide/Silicon nitride dielectric stacks Surface passivation 10.1016/j.solmat.2013.09.004 Solar Energy Materials and Solar Cells 120 PART A 204-208 SEMCE 2014-10-07T04:27:54Z 2014-10-07T04:27:54Z 2014 Article Duttagupta, S., Ma, F.-J., Hoex, B., Aberle, A.G. (2014). Excellent surface passivation of heavily doped p+ silicon by low-temperature plasma-deposited SiOx/SiNy dielectric stacks with optimised antireflective performance for solar cell application. Solar Energy Materials and Solar Cells 120 (PART A) : 204-208. ScholarBank@NUS Repository. https://doi.org/10.1016/j.solmat.2013.09.004 09270248 http://scholarbank.nus.edu.sg/handle/10635/82313 000329595400026 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Boron doped p+ emitters Crystalline silicon Plasma-enhanced chemical vapor deposition Silicon oxide/Silicon nitride dielectric stacks Surface passivation
spellingShingle	Boron doped p+ emitters Crystalline silicon Plasma-enhanced chemical vapor deposition Silicon oxide/Silicon nitride dielectric stacks Surface passivation Duttagupta, S. Ma, F.-J. Hoex, B. Aberle, A.G. Excellent surface passivation of heavily doped p+ silicon by low-temperature plasma-deposited SiOx/SiNy dielectric stacks with optimised antireflective performance for solar cell application
description	10.1016/j.solmat.2013.09.004
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Duttagupta, S. Ma, F.-J. Hoex, B. Aberle, A.G.
format	Article
author	Duttagupta, S. Ma, F.-J. Hoex, B. Aberle, A.G.
author_sort	Duttagupta, S.
title	Excellent surface passivation of heavily doped p+ silicon by low-temperature plasma-deposited SiOx/SiNy dielectric stacks with optimised antireflective performance for solar cell application
title_short	Excellent surface passivation of heavily doped p+ silicon by low-temperature plasma-deposited SiOx/SiNy dielectric stacks with optimised antireflective performance for solar cell application
title_full	Excellent surface passivation of heavily doped p+ silicon by low-temperature plasma-deposited SiOx/SiNy dielectric stacks with optimised antireflective performance for solar cell application
title_fullStr	Excellent surface passivation of heavily doped p+ silicon by low-temperature plasma-deposited SiOx/SiNy dielectric stacks with optimised antireflective performance for solar cell application
title_full_unstemmed	Excellent surface passivation of heavily doped p+ silicon by low-temperature plasma-deposited SiOx/SiNy dielectric stacks with optimised antireflective performance for solar cell application
title_sort	excellent surface passivation of heavily doped p+ silicon by low-temperature plasma-deposited siox/siny dielectric stacks with optimised antireflective performance for solar cell application
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82313
_version_	1821198725008064512

Excellent surface passivation of heavily doped p+ silicon by low-temperature plasma-deposited SiOx/SiNy dielectric stacks with optimised antireflective performance for solar cell application

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