Formation of Ge nanocrystals in HfAlO high-k dielectric and application in memory device

Formation of Ge nanocrystals in HfAlO high-k dielectric and application in memory device

10.1063/1.1767597

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Bibliographic Details
Main Authors: Wang, Y.Q., Chen, J.H., Yoo, W.J., Yeo, Y.-C., Kim, S.J., Gupta, R., Tan, Z.Y.L., Kwong, D.-L., Du, A.Y., Balasubramanian, N.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82374
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/82374

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