Formation of Ge nanocrystals in HfAlO high-k dielectric and application in memory device

• Main Authors: Wang, Y.Q., Chen, J.H., Yoo, W.J., Yeo, Y.-C., Kim, S.J., Gupta, R., Tan, Z.Y.L., Kwong, D.-L., Du, A.Y., Balasubramanian, N.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/82374
• Institution: National University of Singapore

10.1063/1.1767597