Improved electrical performance and thermal stability of HfO2 / Al2 O3 bilayer over HfO2 gate dielectric AlGaN/GaN MIS-HFETs

10.1149/1.3353799

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Main Authors:	Tian, F., Chor, E.F.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82505
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Institution:	National University of Singapore

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spelling	sg-nus-scholar.10635-825052024-11-14T00:57:39Z Improved electrical performance and thermal stability of HfO2 / Al2 O3 bilayer over HfO2 gate dielectric AlGaN/GaN MIS-HFETs Tian, F. Chor, E.F. ELECTRICAL & COMPUTER ENGINEERING 10.1149/1.3353799 Journal of the Electrochemical Society 157 5 H557-H561 JESOA 2014-10-07T04:30:11Z 2014-10-07T04:30:11Z 2010 Article Tian, F., Chor, E.F. (2010). Improved electrical performance and thermal stability of HfO2 / Al2 O3 bilayer over HfO2 gate dielectric AlGaN/GaN MIS-HFETs. Journal of the Electrochemical Society 157 (5) : H557-H561. ScholarBank@NUS Repository. https://doi.org/10.1149/1.3353799 00134651 http://scholarbank.nus.edu.sg/handle/10635/82505 000276555300069 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1149/1.3353799
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Tian, F. Chor, E.F.
format	Article
author	Tian, F. Chor, E.F.
spellingShingle	Tian, F. Chor, E.F. Improved electrical performance and thermal stability of HfO2 / Al2 O3 bilayer over HfO2 gate dielectric AlGaN/GaN MIS-HFETs
author_sort	Tian, F.
title	Improved electrical performance and thermal stability of HfO2 / Al2 O3 bilayer over HfO2 gate dielectric AlGaN/GaN MIS-HFETs
title_short	Improved electrical performance and thermal stability of HfO2 / Al2 O3 bilayer over HfO2 gate dielectric AlGaN/GaN MIS-HFETs
title_full	Improved electrical performance and thermal stability of HfO2 / Al2 O3 bilayer over HfO2 gate dielectric AlGaN/GaN MIS-HFETs
title_fullStr	Improved electrical performance and thermal stability of HfO2 / Al2 O3 bilayer over HfO2 gate dielectric AlGaN/GaN MIS-HFETs
title_full_unstemmed	Improved electrical performance and thermal stability of HfO2 / Al2 O3 bilayer over HfO2 gate dielectric AlGaN/GaN MIS-HFETs
title_sort	improved electrical performance and thermal stability of hfo2 / al2 o3 bilayer over hfo2 gate dielectric algan/gan mis-hfets
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82505
_version_	1821188729278038016

Improved electrical performance and thermal stability of HfO2 / Al2 O3 bilayer over HfO2 gate dielectric AlGaN/GaN MIS-HFETs

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