Metal gate work function engineering on gate leakage of MOSFETs

Metal gate work function engineering on gate leakage of MOSFETs

10.1109/TED.2004.836544

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Bibliographic Details
Main Authors: Hou, Y.-T., Li, M.-F., Low, T., Kwong, D.-L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82681
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Institution: National University of Singapore
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Summary:10.1109/TED.2004.836544

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