Metal-insulator-metal capacitors using atomic-layer-deposited Al 2O3/HfO2/Al2O3 sandwiched dielectrics for wireless communications

10.1116/1.2357746

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Main Authors: Ding, S.-J., Huang, Y.-J., Li, Y., Zhang, D.W., Zhu, C., Li, M.-F.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82685
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-826852023-10-30T20:19:38Z Metal-insulator-metal capacitors using atomic-layer-deposited Al 2O3/HfO2/Al2O3 sandwiched dielectrics for wireless communications Ding, S.-J. Huang, Y.-J. Li, Y. Zhang, D.W. Zhu, C. Li, M.-F. ELECTRICAL & COMPUTER ENGINEERING 10.1116/1.2357746 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 24 6 2518-2522 JVTBD 2014-10-07T04:32:18Z 2014-10-07T04:32:18Z 2006 Article Ding, S.-J., Huang, Y.-J., Li, Y., Zhang, D.W., Zhu, C., Li, M.-F. (2006). Metal-insulator-metal capacitors using atomic-layer-deposited Al 2O3/HfO2/Al2O3 sandwiched dielectrics for wireless communications. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 24 (6) : 2518-2522. ScholarBank@NUS Repository. https://doi.org/10.1116/1.2357746 10711023 http://scholarbank.nus.edu.sg/handle/10635/82685 000243324400005 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1116/1.2357746
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Ding, S.-J.
Huang, Y.-J.
Li, Y.
Zhang, D.W.
Zhu, C.
Li, M.-F.
format Article
author Ding, S.-J.
Huang, Y.-J.
Li, Y.
Zhang, D.W.
Zhu, C.
Li, M.-F.
spellingShingle Ding, S.-J.
Huang, Y.-J.
Li, Y.
Zhang, D.W.
Zhu, C.
Li, M.-F.
Metal-insulator-metal capacitors using atomic-layer-deposited Al 2O3/HfO2/Al2O3 sandwiched dielectrics for wireless communications
author_sort Ding, S.-J.
title Metal-insulator-metal capacitors using atomic-layer-deposited Al 2O3/HfO2/Al2O3 sandwiched dielectrics for wireless communications
title_short Metal-insulator-metal capacitors using atomic-layer-deposited Al 2O3/HfO2/Al2O3 sandwiched dielectrics for wireless communications
title_full Metal-insulator-metal capacitors using atomic-layer-deposited Al 2O3/HfO2/Al2O3 sandwiched dielectrics for wireless communications
title_fullStr Metal-insulator-metal capacitors using atomic-layer-deposited Al 2O3/HfO2/Al2O3 sandwiched dielectrics for wireless communications
title_full_unstemmed Metal-insulator-metal capacitors using atomic-layer-deposited Al 2O3/HfO2/Al2O3 sandwiched dielectrics for wireless communications
title_sort metal-insulator-metal capacitors using atomic-layer-deposited al 2o3/hfo2/al2o3 sandwiched dielectrics for wireless communications
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/82685
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