Microstructural characterization of rf sputtered polycrystalline silicon germanium films
10.1063/1.1423388
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sg-nus-scholar.10635-827002023-10-30T08:01:40Z Microstructural characterization of rf sputtered polycrystalline silicon germanium films Choi, W.K. Teh, L.K. Bera, L.K. Chim, W.K. Wee, A.T.S. Jie, Y.X. PHYSICS ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.1423388 Journal of Applied Physics 91 1 444-450 JAPIA 2014-10-07T04:32:28Z 2014-10-07T04:32:28Z 2002-01-01 Article Choi, W.K., Teh, L.K., Bera, L.K., Chim, W.K., Wee, A.T.S., Jie, Y.X. (2002-01-01). Microstructural characterization of rf sputtered polycrystalline silicon germanium films. Journal of Applied Physics 91 (1) : 444-450. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1423388 00218979 http://scholarbank.nus.edu.sg/handle/10635/82700 000172835600070 Scopus |
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PHYSICS Choi, W.K. Teh, L.K. Bera, L.K. Chim, W.K. Wee, A.T.S. Jie, Y.X. |
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Choi, W.K. Teh, L.K. Bera, L.K. Chim, W.K. Wee, A.T.S. Jie, Y.X. |
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Choi, W.K. Teh, L.K. Bera, L.K. Chim, W.K. Wee, A.T.S. Jie, Y.X. Microstructural characterization of rf sputtered polycrystalline silicon germanium films |
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Choi, W.K. |
title |
Microstructural characterization of rf sputtered polycrystalline silicon germanium films |
title_short |
Microstructural characterization of rf sputtered polycrystalline silicon germanium films |
title_full |
Microstructural characterization of rf sputtered polycrystalline silicon germanium films |
title_fullStr |
Microstructural characterization of rf sputtered polycrystalline silicon germanium films |
title_full_unstemmed |
Microstructural characterization of rf sputtered polycrystalline silicon germanium films |
title_sort |
microstructural characterization of rf sputtered polycrystalline silicon germanium films |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/82700 |
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