Microstructural characterization of rf sputtered polycrystalline silicon germanium films

10.1063/1.1423388

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Bibliographic Details
Main Authors: Choi, W.K., Teh, L.K., Bera, L.K., Chim, W.K., Wee, A.T.S., Jie, Y.X.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82700
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Institution: National University of Singapore
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