MIM capacitors using atomic-layer-deposited high-κ (HfO2)1-x(Al2O3)x dielectrics

• Main Authors: Hu, H., Zhu, C., Yu, X., Chin, A., Li, M.F., Cho, B.J., Kwong, D.-L., Foo, P.D., Yu, M.B., Liu, X., Winkler, J.
• 其他作者: ELECTRICAL & COMPUTER ENGINEERING
• 格式: Article
• 出版: 2014
• 主題: Dispersion; High-κ; Metal-insulator-metal (MIM) capacitor; Thin-film devices; Voltage linearity
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/82701

10.1109/LED.2002.807703