Raman spectroscopy investigation on excimer laser annealing and thickness determination of nanoscale amorphous silicon

Raman spectroscopy investigation on excimer laser annealing and thickness determination of nanoscale amorphous silicon

10.1088/0957-4484/15/5/043

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Bibliographic Details
Main Authors: Zeng, Y.P., Lu, Y.F., Shen, Z.X., Sun, W.X., Yu, T., Liu, L., Zeng, J.N., Cho, B.J., Poon, C.H.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82961
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Institution: National University of Singapore
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Summary:10.1088/0957-4484/15/5/043

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