Random telegraphic signals and low-frequency noise in rapid-thermal-annealed silicon-silicon oxide structures

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

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Main Authors:	Chim, W.K., Leong, K.K., Choi, W.K.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	C-V measurement Flicker noise FTIR Interface state MOS capacitor Oxide fixed charge Random telegraphic signal Rapid thermal annealing Silicon dioxide
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82965
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Institution:	National University of Singapore

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spelling	sg-nus-scholar.10635-829652015-01-07T08:23:52Z Random telegraphic signals and low-frequency noise in rapid-thermal-annealed silicon-silicon oxide structures Chim, W.K. Leong, K.K. Choi, W.K. ELECTRICAL & COMPUTER ENGINEERING C-V measurement Flicker noise FTIR Interface state MOS capacitor Oxide fixed charge Random telegraphic signal Rapid thermal annealing Silicon dioxide Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 40 1 1-6 JAPND 2014-10-07T04:35:37Z 2014-10-07T04:35:37Z 2001-01 Article Chim, W.K.,Leong, K.K.,Choi, W.K. (2001-01). Random telegraphic signals and low-frequency noise in rapid-thermal-annealed silicon-silicon oxide structures. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 40 (1) : 1-6. ScholarBank@NUS Repository. 00214922 http://scholarbank.nus.edu.sg/handle/10635/82965 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
topic	C-V measurement Flicker noise FTIR Interface state MOS capacitor Oxide fixed charge Random telegraphic signal Rapid thermal annealing Silicon dioxide
spellingShingle	C-V measurement Flicker noise FTIR Interface state MOS capacitor Oxide fixed charge Random telegraphic signal Rapid thermal annealing Silicon dioxide Chim, W.K. Leong, K.K. Choi, W.K. Random telegraphic signals and low-frequency noise in rapid-thermal-annealed silicon-silicon oxide structures
description	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Chim, W.K. Leong, K.K. Choi, W.K.
format	Article
author	Chim, W.K. Leong, K.K. Choi, W.K.
author_sort	Chim, W.K.
title	Random telegraphic signals and low-frequency noise in rapid-thermal-annealed silicon-silicon oxide structures
title_short	Random telegraphic signals and low-frequency noise in rapid-thermal-annealed silicon-silicon oxide structures
title_full	Random telegraphic signals and low-frequency noise in rapid-thermal-annealed silicon-silicon oxide structures
title_fullStr	Random telegraphic signals and low-frequency noise in rapid-thermal-annealed silicon-silicon oxide structures
title_full_unstemmed	Random telegraphic signals and low-frequency noise in rapid-thermal-annealed silicon-silicon oxide structures
title_sort	random telegraphic signals and low-frequency noise in rapid-thermal-annealed silicon-silicon oxide structures
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82965
_version_	1681089348954488832

Random telegraphic signals and low-frequency noise in rapid-thermal-annealed silicon-silicon oxide structures

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