Schottky barrier height tuning of silicides on p-type Si (100) by aluminum implantation and pulsed excimer laser anneal

10.1063/1.3645018

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Bibliographic Details
Main Authors:	Koh, S.-M., Wang, X., Thanigaivelan, T., Henry, T., Erokhin, Y., Samudra, G.S., Yeo, Y.-C.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82999
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-82999
record_format	dspace
spelling	sg-nus-scholar.10635-829992023-10-26T20:18:02Z Schottky barrier height tuning of silicides on p-type Si (100) by aluminum implantation and pulsed excimer laser anneal Koh, S.-M. Wang, X. Thanigaivelan, T. Henry, T. Erokhin, Y. Samudra, G.S. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.3645018 Journal of Applied Physics 110 7 - JAPIA 2014-10-07T04:36:02Z 2014-10-07T04:36:02Z 2011-10-01 Article Koh, S.-M., Wang, X., Thanigaivelan, T., Henry, T., Erokhin, Y., Samudra, G.S., Yeo, Y.-C. (2011-10-01). Schottky barrier height tuning of silicides on p-type Si (100) by aluminum implantation and pulsed excimer laser anneal. Journal of Applied Physics 110 (7) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3645018 00218979 http://scholarbank.nus.edu.sg/handle/10635/82999 000295883000051 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1063/1.3645018
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Koh, S.-M. Wang, X. Thanigaivelan, T. Henry, T. Erokhin, Y. Samudra, G.S. Yeo, Y.-C.
format	Article
author	Koh, S.-M. Wang, X. Thanigaivelan, T. Henry, T. Erokhin, Y. Samudra, G.S. Yeo, Y.-C.
spellingShingle	Koh, S.-M. Wang, X. Thanigaivelan, T. Henry, T. Erokhin, Y. Samudra, G.S. Yeo, Y.-C. Schottky barrier height tuning of silicides on p-type Si (100) by aluminum implantation and pulsed excimer laser anneal
author_sort	Koh, S.-M.
title	Schottky barrier height tuning of silicides on p-type Si (100) by aluminum implantation and pulsed excimer laser anneal
title_short	Schottky barrier height tuning of silicides on p-type Si (100) by aluminum implantation and pulsed excimer laser anneal
title_full	Schottky barrier height tuning of silicides on p-type Si (100) by aluminum implantation and pulsed excimer laser anneal
title_fullStr	Schottky barrier height tuning of silicides on p-type Si (100) by aluminum implantation and pulsed excimer laser anneal
title_full_unstemmed	Schottky barrier height tuning of silicides on p-type Si (100) by aluminum implantation and pulsed excimer laser anneal
title_sort	schottky barrier height tuning of silicides on p-type si (100) by aluminum implantation and pulsed excimer laser anneal
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82999
_version_	1781784271559589888

Schottky barrier height tuning of silicides on p-type Si (100) by aluminum implantation and pulsed excimer laser anneal

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