Schottky barrier height tuning of silicides on p-type Si (100) by aluminum implantation and pulsed excimer laser anneal
10.1063/1.3645018
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Main Authors: | Koh, S.-M., Wang, X., Thanigaivelan, T., Henry, T., Erokhin, Y., Samudra, G.S., Yeo, Y.-C. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/82999 |
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Institution: | National University of Singapore |
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