Strained n-MOSFET with embedded source/drain stressors and strain-transfer structure (STS) for enhanced transistor performance

10.1109/TED.2007.915053

Saved in:
Bibliographic Details
Main Authors: Ang, K.-W., Lin, J., Tung, C.-H., Balasubramanian, N., Samudra, G.S., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83081
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
id sg-nus-scholar.10635-83081
record_format dspace
spelling sg-nus-scholar.10635-830812024-11-09T07:32:38Z Strained n-MOSFET with embedded source/drain stressors and strain-transfer structure (STS) for enhanced transistor performance Ang, K.-W. Lin, J. Tung, C.-H. Balasubramanian, N. Samudra, G.S. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING Lateral tensile strain n-MOSFET Silicon-carbon (Si:C) Strain-transfer structure (STS) 10.1109/TED.2007.915053 IEEE Transactions on Electron Devices 55 3 850-857 IETDA 2014-10-07T04:37:02Z 2014-10-07T04:37:02Z 2008-03 Article Ang, K.-W., Lin, J., Tung, C.-H., Balasubramanian, N., Samudra, G.S., Yeo, Y.-C. (2008-03). Strained n-MOSFET with embedded source/drain stressors and strain-transfer structure (STS) for enhanced transistor performance. IEEE Transactions on Electron Devices 55 (3) : 850-857. ScholarBank@NUS Repository. https://doi.org/10.1109/TED.2007.915053 00189383 http://scholarbank.nus.edu.sg/handle/10635/83081 000253505800021 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Lateral tensile strain
n-MOSFET
Silicon-carbon (Si:C)
Strain-transfer structure (STS)
spellingShingle Lateral tensile strain
n-MOSFET
Silicon-carbon (Si:C)
Strain-transfer structure (STS)
Ang, K.-W.
Lin, J.
Tung, C.-H.
Balasubramanian, N.
Samudra, G.S.
Yeo, Y.-C.
Strained n-MOSFET with embedded source/drain stressors and strain-transfer structure (STS) for enhanced transistor performance
description 10.1109/TED.2007.915053
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Ang, K.-W.
Lin, J.
Tung, C.-H.
Balasubramanian, N.
Samudra, G.S.
Yeo, Y.-C.
format Article
author Ang, K.-W.
Lin, J.
Tung, C.-H.
Balasubramanian, N.
Samudra, G.S.
Yeo, Y.-C.
author_sort Ang, K.-W.
title Strained n-MOSFET with embedded source/drain stressors and strain-transfer structure (STS) for enhanced transistor performance
title_short Strained n-MOSFET with embedded source/drain stressors and strain-transfer structure (STS) for enhanced transistor performance
title_full Strained n-MOSFET with embedded source/drain stressors and strain-transfer structure (STS) for enhanced transistor performance
title_fullStr Strained n-MOSFET with embedded source/drain stressors and strain-transfer structure (STS) for enhanced transistor performance
title_full_unstemmed Strained n-MOSFET with embedded source/drain stressors and strain-transfer structure (STS) for enhanced transistor performance
title_sort strained n-mosfet with embedded source/drain stressors and strain-transfer structure (sts) for enhanced transistor performance
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/83081
_version_ 1821220407691182080