Structural characterisation of polycrystalline SiGe thin film

10.1016/S0038-1101(01)00241-6

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Bibliographic Details
Main Authors:	Teh, L.K., Choi, W.K., Bera, L.K., Chim, W.K.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Polycrystalline silicon-germanium films Radio frequency sputtering Silicon-germanium
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83097
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Institution:	National University of Singapore

Description
Summary:	10.1016/S0038-1101(01)00241-6

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